Multi-chamber workpiece processing

Details Multi-chamber workpiece processing Multi-chamber workpiece processing

2010-07-23

2011-12-06

Moore, Karla (Department: 1716)

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C204S298230, C118S719000, C156S345310, C156S345320

Reexamination Certificate

active

08070926

ABSTRACT:
A multi-chamber treatment/processing apparatus includes: a means for controlling/regulating operation of the apparatus providing the following operational sequence: performing a treatment/processing of at least one magnetic and/or magneto-optical disk in treatment/processing chambers, while each inlet gate and each outlet gate of each treatment/processing chamber is in a closed position and gas is exhausted from each buffer/isolation chamber; opening each of the inlet and outlet gates of each of the treatment/processing chambers and transporting the at least one magnetic and/or magneto-optical disk therein to the adjacent buffer/isolation chamber; closing the outlet gate of each of the treatment/processing chambers; transporting each of the magnetic and/or magneto-optical disk through a respective buffer/isolation chamber and initiating a flow of a respective gas to each treatment/processing chamber; and closing the inlet gate of each treatment/processing chamber immediately upon completion of entry of the at least one magnetic and/or magneto-optical disk into the respective treatment/processing chamber.

REFERENCES:
patent: 6176932 (2001-01-01), Watanabe et al.
patent: 6902623 (2005-06-01), Gurary et al.
patent: WO 9609420 (1996-03-01), None

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