Multi-chamber deposition system

Details Multi-chamber deposition system Multi-chamber deposition system

1988-02-16

1989-10-17

Bueker, Richard

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 74, 427177, 4272555, 4272557, 427294, 118718, 118719, 118723, C23C 1600

Patent

active

048746312

ABSTRACT:
A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.

REFERENCES:
patent: 3294670 (1966-12-01), Charschan et al.
patent: 3805736 (1974-04-01), Foehring et al.
patent: 3965163 (1976-06-01), Oda et al.
patent: 4015558 (1977-04-01), Small et al.
patent: 4400409 (1963-08-01), Izu et al.
patent: 4410558 (1983-10-01), Izu et al.
patent: 4438723 (1984-03-01), Cannella et al.

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