Coating apparatus – Gas or vapor deposition – Running length work
Patent
1988-02-16
1989-06-27
Morgenstern, Norman
Coating apparatus
Gas or vapor deposition
Running length work
118723, 118733, 118719, C23C 1600
Patent
active
048419087
ABSTRACT:
A system for the simultaneous deposition of different coatings onto a thin web within a large volume vacuum chamber is disclosed which chamber is provided with a plurality of deposition chambers in which the different layers are deposited onto the film as its moves from a supply roll to a finished take-up roll of coated web. The deposition chambers provided within the large vacuum chamber are provided with separate seals which minimize back diffusion of any dopant gas from adjacent deposition chambers.
REFERENCES:
patent: 3294670 (1966-12-01), Charschan et al.
patent: 3805736 (1974-04-01), Foehring et al.
patent: 3965163 (1976-06-01), Oda et al.
patent: 4015558 (1977-04-01), Small et al.
patent: 4400409 (1963-08-01), Izu et al.
patent: 4410558 (1983-10-01), Izu et al.
patent: 4438723 (1984-03-01), Cannella et al.
Jacobson Richard L.
Jeffrey Frank R.
Westerberg Roger K.
Baeker Margaret
Kirn Walter N.
Minnesota Mining and Manufacturing Company
Morgenstern Norman
Schultz Leland D.
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