Multi-beam semiconductor laser device

Coherent light generators – Particular active media – Semiconductor

Reexamination Certificate

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Details

C372S050121, C372S050122

Reexamination Certificate

active

07149235

ABSTRACT:
A multi-beam semiconductor laser device capable of emitting respective laser beams with uniform optical output levels and enabling easy alignment is provided. This multi-beam semiconductor laser device (40) is a GaN base multi-beam semiconductor laser device provided with four laser stripes (42A,42B,42C and42D) which are capable of emitting laser beams with the same wavelength. The respective laser oscillating regions (42A to42D) are provided with a p-type common electrode (48) on a mesa structure (46) which is formed on a sapphire substrate (44), and have active regions (50A,50B,50C and50D) respectively. Two n-type electrodes (52A and52B) are provided on an n-type GaN contact layer (54) and located as common electrodes opposite to the p-type common electrode (48) on both sides of the mesa structure (46). The distance A between the laser stripe (42A) and the laser stripe (42D) is no larger than 100 μm. The distance B1between the laser stripe (42A) and the n-type electrode (52B) is no larger than 150 μm while the distance B2between the laser stripe (42D) and the n-type electrode (52A) is no larger than 150 μm.

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Tsuyoshi Tojo, et al.,“GaN-based High Power Blue-violet Laser Diodes”, Proceedings of International Workshop on Nitride Semiconductors, IPAP Conference Series 1 (2000), pp. 878-882.

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