Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Electron or ion source
Patent
1976-10-05
1978-05-02
Demeo, Palmer C.
Electric lamp and discharge devices: systems
Discharge device load with fluent material supply to the...
Electron or ion source
313359, 3132313, H05H 100
Patent
active
040877205
ABSTRACT:
A multi-beam, multi-aperture ion source of the beam-plasma type comprises three major regions: the first region where there is created a plurality of electron beams useful for the extraction and focusing of ions; the second region where a gaseous discharge is effected with the aid of the electron beams emerging from the first region, and high frequency oscillation or microwave oscillation is provided by utilization of instability due to electron beam-plasma interactions to thereby create high density ions by that heating energy; and the third region where the electron beams from the second region are collected through the use of a collector, and construction and applied voltage is adjusted to facilitate the high frequency oscillation. The numerous ions created within the second region are trapped into the form of finely focused beams by the well of negative potential which is defined by the plurality of the electron beams emerging from the first region. The resulting ion beams are extracted and combined in a direction opposite to the direction of the electron beams, thereby producing a single well-focused ion beam.
REFERENCES:
patent: 2969480 (1961-01-01), Klein
patent: 3005121 (1961-10-01), George
patent: 3846668 (1974-11-01), Ehlers et al.
DeMeo Palmer C.
Sharp Kabushiki Kaisha
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