Multi-beam laser exposure unit having anamorphic lens comprising

Details Multi-beam laser exposure unit having anamorphic lens comprising Multi-beam laser exposure unit having anamorphic lens comprising

1995-09-13

1998-05-05

Dzierzynski, Paul M.

Optical: systems and elements

Deflection using a moving element

Using a periodically moving element

359204, 359207, 359216, 359217, 347244, G02B 2608

Patent

active

057483558

ABSTRACT:
A multi-beam laser exposure unit includes a light beam deflector for deflecting light beam in a predetermined direction, a plurality of laser devices, a pre-deflection optical system, including a glass lens and a plastic lens, for converting a cross sectional shape of light beam emitted from the respective laser devices to a predetermined shape, and a post-deflection optical system, including three lenses for image-forming each light beam deflected by the deflector to be scanned on a predetermined image surface at a uniform speed. Power of three lenses of the post-deflection optical system is defined to be positive, negative, positive in order in a direction parallel to a rotational axis of each of reflective surfaces of the deflector from the side close to the deflector. Also, the power of three lenses of the post-deflection optical system is defined to be positive, negative, positive in order in a direction perpendicular to the rotational axis. Thereby, an effective deflection angle can be enlarged and a registration error can be reduced.

REFERENCES:
patent: 4634232 (1987-01-01), Tateoka
patent: 5086350 (1992-02-01), Nishihata

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