Multi-beam exposure unit

Optical: systems and elements – Deflection using a moving element – Using a periodically moving element

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

359210, 359211, 359216, 347243, G02B 2608

Patent

active

059952687

ABSTRACT:
According to the present invention, there is provided an improved multi-beam exposure unit using a plurality of beams for scanning, in which shifts between the beams are reduced so that images can be accurately superposed without color shifts or variations in beam spaces. The multi-beam exposure unit according to the invention has a pre-deflection optical system, which includes light sources, each having light-emitting points arranged individually in the respective positions of the vertexes of a triangle defined by m=3, and a mechanism for collectively adjusting the sub-scanning-direction spaces between light beams from the light sources on an image surface, a deflector having rotatable reflecting surfaces and capable of deflecting the light beams from the pre-deflection optical system in predetermined directions by rotating the reflecting surfaces at a predetermined speed, and a post-deflection optical system for continuously focusing m number of light beams, deflected by the deflector, on the image surface. Thus, the spaces between the three light beams in the sub-scanning direction can be equalized substantially.

REFERENCES:
patent: 5255115 (1993-10-01), Kikuchi
patent: 5469290 (1995-11-01), Maeda
patent: 5715078 (1998-02-01), Shiraishi
patent: 5798784 (1998-08-01), Nonaka et al.
patent: 5812299 (1998-09-01), Minakuchi et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Multi-beam exposure unit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Multi-beam exposure unit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multi-beam exposure unit will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1680504

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.