Multi-beam exposer unit

Details Multi-beam exposer unit Multi-beam exposer unit

1997-07-31

2000-08-08

Le, N.

Incremental printing of symbolic information

Light or beam marking apparatus or processes

Scan of light

347241, 347244, 359205, B41J 2385

Patent

active

061009121

ABSTRACT:
A multi-beam exposer unit 1 includes ##EQU1## half mirror 11 for synthesizing ##EQU2## light to M groups of light beams, M sets of optical members 12, having positive power with a large absolute value as compared with a case of a main scanning direction, for further converging the beam in a sub-scanning direction, a synthesizing reflection mirror 13 for reflecting M groups of beams to be substantially overlaid on each other in a first direction, a polygon mirror unit 5 for deflecting M groups of beams, and a dust prevention glass 14 inclined to a direction opposite to a direction where the half mirror is inclined, thereby reducing influence of coma aberration exerted on M groups of beams by the half mirror.

REFERENCES:
patent: 5715079 (1998-02-01), Ono
patent: 5734489 (1998-03-01), Shiraishi et al.
patent: 5774249 (1998-06-01), Shiraishi et al.
patent: 5806428 (1998-09-01), Koppelkamm et al.

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