Multi-axis compound lens, beam system making use of the...

Details Multi-axis compound lens, beam system making use of the... Multi-axis compound lens, beam system making use of the...

2007-08-07

2007-08-07

Wells, Nikita (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S3960ML, C250S306000, C250S307000, C250S492200, C250S492300

Reexamination Certificate

active

10539179

ABSTRACT:
The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

REFERENCES:
patent: 6750455 (2004-06-01), Lo et al.
patent: 6784442 (2004-08-01), Muraki et al.
patent: 2001/0028038 (2001-10-01), Hamaguchi
patent: 0790634 (1997-08-01), None
patent: 2002-150989 (2002-05-01), None
Haraguchi, T., et al., “Development of Electromagnetic Lenses for Multielectron Beam Lithography System,”Journal of Vacuum Science&Technology B, (Microelectronics and Nanometer Structures), Nov. 2002, AIP for American Vacuum Soc., USA, vol. 20, No. 6, Nov. 2002, pp. 2726-2729, XP002251379, ISSN: 0734-211X, the whole document.
Patent Abstracts of Japan, vol. 2002, No. 09, Sep. 4, 2002.

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