Etching a substrate: processes – Forming or treating article containing magnetically...
Patent
1997-07-15
1999-08-10
Breneman, Bruce
Etching a substrate: processes
Forming or treating article containing magnetically...
216 45, B44C 122
Patent
active
059354534
ABSTRACT:
A magnetoresistive (MR) sensor having passive end regions separated by a central active region in which an MR sensing element is formed over substantially only the central active region. The MR sensor is defined by forming a resist pattern over both the end regions and the MR sensing element followed by an etching step where the duration of the etching is controlled by the time it takes to remove the exposed end regions' material and not by the time it takes to remove the excess MR material in the center active region. This creates an MR sensor having planar sides along the circumference of the end regions where the planar sides have no thinned edges or shoulders. The MR sensor further has no remnant MR material along the inner planar side of the end regions behind the MR sensor's trackwidth edge and adjacent to the MR sensor's back side.
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Fontana Robert E.
Lin Tsann
Robertson Neil Leslie
Tsang Ching Hwa
Berthold Thomas R.
Breneman Bruce
International Business Machines - Corporation
Powell Alva
Saber Paik
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