MPD Intense beam pulser

Details MPD Intense beam pulser MPD Intense beam pulser

1981-07-21

1983-12-20

La Roche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load with fluent material supply to the...

Electron or ion source

3133591, 31511161, 31511191, H01J 2702

Patent

active

044220138

ABSTRACT:
An MPD intense beam pulser for generating high voltage, intense charged picle beams utilizing an electromechanical energy source and inductive energy storage in combination with a plasma opening switch including a source of directed plasma flow, a diode for accelerating particles in the plasma flowing from the source, and a plasma flow truncation circuit. In operation, a controlled plasma flow is used to conduct current from the energy source in order to supply a desired amount of energy to the magnetic field in the volume surrounding the plasma flow. Truncation of the plasma flow between the electrodes forming the diode then provides a high voltage in a short pulse which generates a high energy charged particle beam. Thus, the magnetic energy store surrounding the diode plasma flow is coupled directly to the intense particle beam.

REFERENCES:
patent: 2883580 (1959-04-01), Kilpatrick
patent: 3137820 (1964-06-01), McFarland
patent: 3462633 (1969-08-01), McCoy
patent: 3535586 (1970-10-01), Sabol

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