Moving interferometer wafer stage

Details Moving interferometer wafer stage Moving interferometer wafer stage

1996-12-23

1998-05-26

Ro, Bentsu

Electricity: motive power systems

Positional servo systems

With particular 'error-detecting' means

318640, 33 1M, 356358, 356363, G01B 902

Patent

active

057571600

ABSTRACT:
A stage used for positioning and aligning a wafer, as used in photolithography or microlithography in semiconductor manufacturing having a plurality of interferometer laser gauges placed on a movable wafer stage associated with a pair of stationary orthogonal return mirrors. A beam of light parallel to the X axes is directed through a penta prism to an interferometer laser gauges placed on the wafer stage near the wafer plane through a plurality of beamsplitters and fold mirrors. The present invention is less sensitive to rotation or twisting of the wafer stage and eliminates or reduces certain errors introduced by the rotation. Additionally, large stable return mirrors may be used, increasing the travel distance permitted by the wafer stage while reducing weight on the wafer stage. The wafer stage can be more accurately positioned and accommodate larger wafer sizes with improved positioning and alignment accuracies.

REFERENCES:
patent: 3648048 (1972-03-01), Cahan et al.
patent: 4952858 (1990-08-01), Galburt
patent: 4984891 (1991-01-01), Miyazaki et al.
patent: 5285142 (1994-02-01), Galburt et al.
patent: 5363196 (1994-11-01), Cameron

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