Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2008-04-22
2008-04-22
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C074S4710XY
Reexamination Certificate
active
07361910
ABSTRACT:
A movable stage apparatus includes a reticle stage on which a reflecting reticle is to be mounted, in which when a space is divided by a plane including a reflection surface of the reticle, a guide surface to guide movement of the master reticle stage is arranged in a space opposite to a space where an exposure light beam to be reflected by the reticle passes. The reticle stage includes a coarse movement stage which reciprocally moves on the guide surface formed on a base of the movable stage apparatus in a scanning direction along the guide surface in non-contact with the coarse movement stage and has a six-axis alignment mechanism. The reflection surface of the reticle is arranged to face vertically downward, and the fine movement stage is supported in non-contact with the coarse movement stage and is positioned in six-axis directions by a six-axis alignment mechanism, and by a self weight support mechanism which supports a weight of the fine movement stage.
REFERENCES:
patent: 5040431 (1991-08-01), Sakino et al.
patent: 5440397 (1995-08-01), Ono et al.
patent: 5523843 (1996-06-01), Yamane et al.
patent: 5684856 (1997-11-01), Itoh et al.
patent: 5858587 (1999-01-01), Yamane et al.
patent: 5864389 (1999-01-01), Osanai et al.
patent: 5886432 (1999-03-01), Markle
patent: 5925956 (1999-07-01), Ohzeki
patent: 6040675 (2000-03-01), Ono
patent: 6072183 (2000-06-01), Itoh et al.
patent: 6259174 (2001-07-01), Ono
patent: 6281655 (2001-08-01), Poon et al.
patent: 6639333 (2003-10-01), Kamata et al.
patent: 6717159 (2004-04-01), Novak
patent: 6770890 (2004-08-01), Tanaka
patent: 7139065 (2006-11-01), Ono
patent: 2002/0140298 (2002-10-01), Maruyama
patent: 1143492 (2001-10-01), None
patent: 10-12539 (1998-01-01), None
Won-Jong, et al. “High-precision magnetic levitation stage for photolithography,” Precision Engineering, 22:66-77, 1998.
Chen, et al. “Design and control for an electromagnetically driven x-y-theta stage,” Precision Engineering, 26 (2002) 355-369.
Berman Jack I.
Canon Kabushiki Kaisha
Fitzpatrick ,Cella, Harper & Scinto
Maskell Michael
LandOfFree
Movable stage apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Movable stage apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Movable stage apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2798505