Movable device for heating substrates

Electric heating – Metal heating – By arc

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Details

219209, 2191214, 20429815, 20429823, 20429809, B23K 900

Patent

active

051226367

ABSTRACT:
A device for heating up a substrate to be coated in a vacuum coating system, for example a plasma sputtering system, has a heating device 23 disposed on a substrate carriage 20 which can be moved across the process chamber transversely to the coating source. This heating device has an independent voltage generator, for example a rechargeable accumulator, disposed in a special chamber of the heating device. The chamber for the accumulators can be hermetically sealed by way of a cover such that this chamber is under atmospheric pressure even when the substrate carraige 20, together with the heating device 23, enters the process chamber of the system which contains the vacuum. The accumulators are recharged via plug couplings 14,14' after the heating device has heated up the substrate 8 which is clamped thereto and the device has exited the process chamber via a sluiceway.

REFERENCES:
patent: 3622753 (1971-11-01), Lax et al.
patent: 3705285 (1972-12-01), Cachat
patent: 4194962 (1980-03-01), Chambers et al.
patent: 4261808 (1981-04-01), Walter
patent: 4273989 (1981-06-01), Hinton et al.
patent: 4282924 (1981-08-01), Faretra
patent: 4430547 (1984-02-01), Yoncola et al.
patent: 4650064 (1987-03-01), Slabaugh
patent: 4828668 (1989-05-01), Yamazaki et al.

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