Supports – Resilient support – Suspended
Patent
1995-04-17
1997-11-18
Gorski, Joseph M.
Supports
Resilient support
Suspended
378 34, F16M 1300
Patent
active
056879474
ABSTRACT:
A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container is disclosed. The method is particularly applicable to an SOR X-ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument is hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given latitude only in the x direction. By this arrangement, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.
REFERENCES:
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patent: 4135688 (1979-01-01), England
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patent: 4352643 (1982-10-01), Iijima
patent: 4803712 (1989-02-01), Kembo et al.
patent: 5164974 (1992-11-01), Kariya et al.
Chiba Hiroshi
Ebinuma Ryuichi
Iwamoto Kazunori
Kariya Takao
Ohkawa Shinkichi
Canon Kabushiki Kaisha
Gorski Joseph M.
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