X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1992-10-14
1993-12-07
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 84, G21K 106
Patent
active
052689549
ABSTRACT:
A mounting mechanism for a double crystal monochromator or the like has a parallelogram based mounting mechanism in which two of the vertices of the parallelogram are fixed in position, and two vertices are free to translate back and forth in a straight line parallel to the fixed base of the parallelogram. One diffractor is mounting for pivoting at one of the fixed vertices, and the second diffractor is mounted for pivoting at an adjacent movable vertex. The surfaces of the diffractors are maintained parallel as the angle of the diffractors with respect to input and output beams to the monochromator is changed to change the wavelength being passed. The diffractor mounted at the fixed pivot may be connected to a large diameter wheel which in turn is connected by a band to a smaller diameter wheel mounted for rotation at the other fixed vertex of the parallelogram, with a pivotable arm connected to the smaller wheel to rotate therewith. Another larger diameter wheel is connected to the diffractor at the movable vertex and is connected by a band to a smaller diameter wheel at the adjacent movable vertex of the parallelogram, where the smaller wheel is connected by a slider to the pivotable arm. As the movable diffractor is translated in position, the arm pivots to cause the small wheels to move through the same angle of angular displacement as the pivotable arm. The corresponding angular displacement of the diffractors may be one half the angular displacement of the pivotable arm where the larger wheels are twice the diameter of the smaller wheels.
REFERENCES:
patent: Re26053 (1966-07-01), Cary
patent: 3160749 (1964-12-01), Spielberg
patent: 3176131 (1965-03-01), Romand et al.
patent: 3384756 (1968-05-01), Hasler et al.
patent: 3418051 (1968-12-01), Staunton
patent: 3445653 (1969-05-01), Tomura
patent: 4365156 (1982-12-01), Golovchenko et al.
patent: 4398823 (1983-08-01), Brown et al.
patent: 4446568 (1984-05-01), Williams et al.
patent: 4462689 (1984-07-01), Kabler et al.
patent: 4490041 (1984-12-01), Riemer
patent: 4553253 (1985-11-01), Petersen
patent: 4580283 (1986-04-01), Hornstra
patent: 4637041 (1987-01-01), Brinkgreve et al.
patent: 4698833 (1987-10-01), Keem et al.
patent: 4752945 (1988-06-01), Jenkins et al.
patent: 4882780 (1989-11-01), Wittry
patent: 4885760 (1989-12-01), Van Tol et al.
patent: 5157702 (1992-10-01), Middleton et al.
J. A. Golovchenko, et al., "X-Ray Monochromator System for Use With Synchrotron Radiation Sources," Rev. Sci. Instru., vol. 52, No. 4, Apr. 1981, pp. 509-516.
D. M. Mills, et al., "A Fixed Exit Sagittal Focusing Monochromator Utilizing Bent Single Crystals," Nuclear Instruments and Methods in Physics Research, A246, 1986, pp. 356-359.
D. Shu, et al., "UHV Compatible Compact Double-Crystal Monochromator at BEPC Diffraction and Scattering Beamline 4B9A," Rev. Sci. Instrum. vol. 60, No. 7, Jul. 1989, pp. 2054-2057.
S. L. Hulbert, et al., "An Ultrahigh-Vacuum Multiple Grating Chamber and Scan Drive With Improved Grating Change," Nuclear Instruments and Methods in Physics Research, A291, 1990, pp. 343-347.
Article entitled "Chamber Allows Changes in Grating Position," Design News, Feb. 12, 1990, pp. 154-155.
C. Kunz, et al., "A Grazing Incidence Vacuum Ultraviolet Monochromator with Fixed Exit Slit," Rev. Sci. Instrum., vol. 43, No. 3, Mar. 1972, pp. 434-442.
Y. Xie, et al., "A Double-Crystal Monochromator for EXAFS at BSRL," Rev. Sci. Instrum., vol. 63, No. 1, Jan. 1992, pp. 956-957.
H. Tolentino, et al., "High-Resolution Monochromator for Soft and Hard X-Rays," Rev. Sci. Instrum., vol. 63, No. 1, Jan. 1992, pp. 946-949.
J. P . Kirkland, "HV-Compatible Fixed-Exit Two/Four Crystal Monochromator," Nuclear Instruments and Methods in Physics Research, A291, 1990, pp. 185-191.
T. Iwazumi, et al., "Double-Crystal Monochromator for High-Power and High-Energy Synchrotron Radiation," Rev. Sci. Instrum., vol. 63, No. 1, Jan. 1992, pp. 419-422.
B. X. Yang, et al., "Double-Crystal Monochromator Beam Line on the Alladin 1-GeV Storage Ring," Rev. Sci. Instrum., vol. 63, No. 1, Jan. 1992, pp. 1355-1358.
M. Correa, et al., "A Two-Crystal Monochromator for the UVX Ring of LNLS," Rev. Sci. Instrum., vol. 63, No. 1, Jan. 1992, pp. 896-898.
R. F. Garrett, et al., "A High-Energy Double-Crystal Fixed Exit Monochromator for the X17 Superconducting Wiggler Beam Line at the NSLS," Rev. Sci. Instrum., vol. 63, No. 1, Jan. 1992, pp. 595-598.
Church Craig E.
Wisconsin Alumni Research Foundation
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