Mounting and excitation system for reaction in the plasma state

Details Mounting and excitation system for reaction in the plasma state Mounting and excitation system for reaction in the plasma state

1980-01-16

1981-09-08

Kendall, Ralph S.

Coating apparatus

Gas or vapor deposition

With treating means

118721, 118728, 118500, 427 39, C23C 1308

Patent

active

042878519

ABSTRACT:
Apparatus for supporting a plurality of wafer-like substrates so as to be treatable in a plasma environment. At least three plate-like electrically conductive electrodes are provided. They are parallel to and spaced from one another along an axis. A support adjacent to each electrode supports a wafer-like substrate against at least one of the faces of at least one electrode of a pair of adjacent electrodes. A first conductive bus is conductively connected to a first set of alternate ones of the electrodes, and a second conductive bus is also provided. An individual capacitative coupling is respective to each member of a second set of the electrodes and is connected to the second bus so that each pair of adjacent electrodes and the respective capacitative coupling are in series connection, and all of the pairs of electrodes are in parallel connection.

REFERENCES:
patent: 1965059 (1934-07-01), Seibt
patent: 3578495 (1971-05-01), Pammer et al.
patent: 3637434 (1972-01-01), Nakanuma et al.
patent: 3672948 (1972-06-01), Foehring et al.
patent: 3989004 (1976-11-01), Scholer
patent: 3998333 (1976-12-01), Kamada
patent: 4016006 (1977-05-01), Yoshinaka et al.
patent: 4048953 (1977-09-01), Froberg
patent: 4053294 (1977-10-01), Sullivan
patent: 4069009 (1978-01-01), Yamawaki et al.
patent: 4098923 (1978-07-01), Alberti et al.
patent: 4108106 (1978-08-01), Dozier
IBM Technical Disclosure Bulletin, vol. 13, No. 6, Nov. 1970, p. 1459, Eshback et al., "Emitter Diffusion System".
IBM Technical Disclosure Bulletin, vol. 19, No. 10, Mar. 1977, pp. 3734-3735, Clark et al. "Water Holder".

Affiliated with

Also associated with

Rating

Mounting and excitation system for reaction in the plasma state does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mounting and excitation system for reaction in the plasma state, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mounting and excitation system for reaction in the plasma state will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1187933