Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2008-01-08
2008-01-08
Wu, David W. (Department: 1713)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S311000, C428S014000, C428S421000, C428S422000, C359S350000
Reexamination Certificate
active
10649355
ABSTRACT:
A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.
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Eschbach Florence
Lo Fu-Chang
Tregub Alexander
Zimmerman Paul
Hu Henry S.
Wu David W.
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