Radiation imagery chemistry: process – composition – or product th – Registration or layout process other than color proofing
Patent
1983-06-20
1985-10-15
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Registration or layout process other than color proofing
430320, 430323, 430394, 356399, 356401, G03F 900
Patent
active
045474460
ABSTRACT:
The present invention is directed to motion measurement and alignment method and apparatus for use, interalia, in association with optical lithographic systems and more particularly in one form thereof to a method of making a wafer-tool for testing the mask-wafer stage motion and the mask-wafer stage alignment comprising the steps of: inserting a master mask, having an alignment pattern and a motion measurement pattern thereon, into a projection mask aligner, inserting a photoresist-coated semiconductor wafer into said projection mask aligner, aligning the mask and wafer with respect to each other using the alignment pattern, exposing the photoresist on the wafer, chemically etching the wafer to perfect the motion measurement pattern thereon, thereby forming a wafer-tool having an image of the motion measurement pattern. According to one aspect of the invention there is provided a universal master mask for use in making a wafer-tool for testing the mask-wafer stage motion and the mask-wafer stage alignment in an optical lithographic system which includes a pattern of opaque and transparent areas formed on a transparent substrate wherein one of the areas is characterized by an alignment pattern and a separate motion measurement pattern.
REFERENCES:
patent: 3783520 (1974-01-01), King
Dees Jos,e G.
Grimes Edwin T.
Kittle John E.
Masselle Francis L.
Murphy Thomas P.
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