MOSFET with isolation structure for monolithic integration...

Active solid-state devices (e.g. – transistors – solid-state diode – Integrated circuit structure with electrically isolated... – Including high voltage or high power devices isolated from...

Reexamination Certificate

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C257S297000, C438S297000

Reexamination Certificate

active

07847365

ABSTRACT:
A MOSFET device with an isolation structure for a monolithic integration is provided. A P-type MOSFET includes a first N-well disposed in a P-type substrate, a first P-type region disposed in the first N-well, a P+ drain region disposed in the first P-type region, a first source electrode formed with a P+ source region and an N+ contact region. The first N-well surrounds the P+ source region and the N+ contact region. An N-type MOSFET includes a second N-well disposed in a P-type substrate, a second P-type region disposed in the second N-well, an N+drain region disposed in the second N-well, a second source electrode formed with an N+ source region and a P+ contact region. The second P-type region surrounds the N+ source region and the P+ contact region. A plurality of separated P-type regions is disposed in the P-type substrate to provide isolation for transistors.

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patent: 5602416 (1997-02-01), Zambrano
patent: 2004/0169236 (2004-09-01), Sridhar et al.
patent: 2006/0220170 (2006-10-01), Huang et al.
patent: 2008/0116513 (2008-05-01), Williams et al.
patent: 2008/0210980 (2008-09-01), Disney et al.
patent: 1155764 (1997-07-01), None
patent: 0 871 215 (1998-10-01), None

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