Patent
1989-05-24
1991-02-19
Hille, Rolf
357 36, 357 35, 357 38, 357 238, 357 22, 357 2314, H01L 2972, H01L 2974, H01L 2910, H01L 2980
Patent
active
049949047
ABSTRACT:
A MOSFET includes a base layer of a first conductivity type selectively formed in the surface layer of a high-resistance semiconductor layer, and a source layer of a second conductivity type selectively formed in the surface layer of the base layer. A drain layer of the second conductivity type is formed in the front or rear surface layer of the high-resistance semiconductor layer so as to be separated from the base layer by a predetermined distance. A gate insulating film is formed on the base layer, and a gate electrode is formed on the gate insulating film. A voltage detection terminal layer of the second conductivity type independent from the source layer is formed in the base layer. A voltage detection electrode is in contact with the voltage detection terminal layer.
REFERENCES:
patent: 4344081 (1982-08-01), Pao et al.
patent: 4553084 (1985-11-01), Wrathall
patent: 4680604 (1987-07-01), Nakagawa et al.
patent: 4823173 (1989-04-01), Beasom
1982 IEDM Technical Digest, pp. 264-267; B. J. Baliga et al.
1983 IEDM Technical Digest, pp. 416-419; H. Wakaumi et al.
Nakagawa Akio
Yamaguchi Yoshihiro
Hille Rolf
Kabushiki Kaisha Toshiba
Potter Roy K.
LandOfFree
MOSFET having drain voltage detection function does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with MOSFET having drain voltage detection function, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MOSFET having drain voltage detection function will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1148463