Mosaic target

Details Mosaic target Mosaic target

1995-02-22

1995-11-14

Zimmerman, John

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429812, C23C 1434

Patent

active

054663555

ABSTRACT:
A mosaic target comprising a plurality of target block pieces of different kinds of materials selected from the group consisting of Ta, Mo, Ti, W, Zr, Nb and Si, and their alloys and compounds, said target block pieces being combined in a stripe pattern or in a radial pattern characterized in that said target block pieces have their abutting interfaces solid-phase bonded at a temperature no more than the melting points of the target block piece materials. A typical example is a Ta-Mo mosaic target. The solid-phase bonded mosaic target blank is machined to a target which is bonded to a backing plate. The solid-phase bonding produces a mosaic target of a unitary construction, eliminating gaps among the target block pieces without sacrificing the properties of the individual block pieces. Abnormal discharge owing to gaps or contamination of the resulting film by concurrent sputtering of the solder or the backing plate is avoided.

REFERENCES:
patent: 4620872 (1986-11-01), Hijikata et al.
patent: 5190630 (1993-03-01), Kikuchi et al.
patent: 5282946 (1994-02-01), Kinoshita et al.

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