Semiconductor device manufacturing: process – Voltage variable capacitance device manufacture
Reexamination Certificate
2007-04-05
2009-11-17
Vu, Hung (Department: 2811)
Semiconductor device manufacturing: process
Voltage variable capacitance device manufacture
C438S514000, C438S526000
Reexamination Certificate
active
07618873
ABSTRACT:
A MOS varactor includes a shallow PN junction beneath the surface of the substrate of a MOS structure. In depletion mode, the depletion region of the MOS structure merges with the depletion region of the shallow PN junction. This increases the total width of the depletion region of the MOS varactor to reduce Cmin.
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Herbert S. Bennett et al., Device Technology Evolution for Si-Based RF Integrated Circuits, IEEE Transactions on Electron Devices, vol. 52, No. 7, Jul. 2005, pp. 1235-1258.
Sarkar Manju
Verma Purakh Raj
Chartered Semiconductor Manufacturing Ltd.
Horizon IP Pte Ltd
Vu Hung
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