Semiconductor device manufacturing: process – Formation of electrically isolated lateral semiconductive... – Field plate electrode
Patent
1998-04-27
1999-06-29
Bowers, Charles
Semiconductor device manufacturing: process
Formation of electrically isolated lateral semiconductive...
Field plate electrode
438159, 438183, 438267, 257294, 257340, H01L 21336, H01L 2910
Patent
active
059181370
ABSTRACT:
A MOS transistor including a gate electrode on a gate oxide over a channel region between a source region and a drain region also includes a shield electrode at least partially on the gate oxide adjacent to, self-aligned with, and at least partially coplanar with the gate electrode and between the gate electrode and drain region. Placing the shield electrode on the gate oxide improves the gate-drain shielding, reduces the gate-drain capacitance, Cgd, and reduces hot electron related reliability hazard.
REFERENCES:
patent: 5445978 (1995-08-01), Yilmaz
patent: 5672526 (1997-09-01), Kawamura
Hebert Francois
Ng Sze Him
Blum David S.
Bowers Charles
Spectrian, Inc.
Woodward Henry K.
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