MOS transistor

Patent

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Details

357 55, 357 231, H01L 2978

Patent

active

047107901

ABSTRACT:
A gate electrode (4') of a MOS transistor is formed in a depression (16) provided in a substrate (1). Source and drain regions (6 and 7) of the MOS transistor are formed in the substrate (1) to be opposed to each other with the gate electrode (4') being located therebetween.

REFERENCES:
patent: 4243997 (1981-01-01), Natori

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