MOS Semiconductor device and method of manufacturing the same

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 238, 357 236, 357 2311, 357 2312, 357 233, 357 23, H01L 2978

Patent

active

045232130

ABSTRACT:
An MOS semiconductor device, wherein a buried region of silicon oxide or silicon nitride extends partly over the bottom plane of the channel region of an MOS transistor.

REFERENCES:
patent: 3514676 (1976-06-01), Fa
patent: 4023195 (1977-05-01), Richman

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

MOS Semiconductor device and method of manufacturing the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with MOS Semiconductor device and method of manufacturing the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and MOS Semiconductor device and method of manufacturing the same will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1186136

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.