MOS component with a particular source and base structure

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

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Details

257329, 257140, H01L 2978, H01L 29784

Patent

active

053960882

ABSTRACT:
The source zone of an MOS component on a semiconductor body is disposed on the upper side of the gate electrode, and is in contact at an upper side of the source zone, with a source electrode. The base zone laterally adjoins the source zone and laterally adjoins the gate electrode at the drain zone. The minority charge carriers which flow from the semiconductor body to the cathode therefore flow directly to the source electrode through that part of the base zone disposed next to the gate electrode. An activation of a parasitic bipolar transistor, and thus the occurrence of so-called second breakdown, are thus avoided.

REFERENCES:
patent: 5034785 (1991-07-01), Blanchard
"Latch-Back-Free Self-Aligned Power MOSFET Structure with Silicided Source and Body Contact," Koh et al IEEE Electron Device Letters, vol. 9, No. 8, Aug. 1988 (pp. 408-410).

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