Chemistry of carbon compounds – Miscellaneous organic carbon compounds – C-metal
Patent
1973-08-03
1976-11-23
Weinberger, Lorraine A.
Chemistry of carbon compounds
Miscellaneous organic carbon compounds
C-metal
526298, 26032613R, 2603322A, 2603474, 260465D, 260472, 260469, 260473R, 260476R, 526309, 526312, 526321, C07C10146
Patent
active
039936848
ABSTRACT:
Photosensitive homopolymers and substantially non-crosslinked copolymers containing the recurring unit: ##EQU1## R.sub.1 may be substituted or unsubstituted alkylene, aralkylene, alkoxyalkylene or aryloxyalkylene. R.sub.2 is a substituted or unsubstituted aryl group or heterocyclic group having aromatic character. R.sub.3, R.sub.4, and R.sub.5 are hydrogen, halogen or lower alkyl. R.sub.6 and R.sub.7 may be hydrogen, halogen, nitro, lower alkyl, phenyl, substituted phenyl, phenoxy and lower alkoxy. Lithographic plates bearing these photosensitive polymers can be stored without deterioration for extended periods prior to exposure, and produce highly abrasion resistant plates on being exposed. The photosensitive polymers of the invention are preferably produced by homopolymerization of novel monomers having the general formula ##EQU2## where R.sub.1 .sub.' is alkylene, haloalkylene, alkoxyalkylene, aminoalkylene, cycloalkylene, aralkylene, cycloalkylalkylene, cyanoalkylene, and aryloxyalkylene, and R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, and R.sub.7 are as defined above; and by copolymerization of these monomers with one or more ethylenically unsaturated comonomers. Methods of preparing the photopolymers and the novel monomers are also disclosed, as are methods of preparing and exposing plates bearing the polymers.
REFERENCES:
finar, I. L. Organic Chemistry, vol. I (1931), pub. by Richard Clay & Co., Great Britain pp. 200 - 202 relied on.
Dunnavant William R.
Harris Edward M.
Kurz Philip F.
Markle Richard A.
Parker Edward H.
Thaxton L. A.
Weinberger Lorraine A.
Western Litho Plate & Supply Co.
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