Monomer and polymer for photoresist, photoresist...

Details Monomer and polymer for photoresist, photoresist... Monomer and polymer for photoresist, photoresist...

2002-02-14

2004-03-02

Pezzuto, Helen L. (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

C526S270000, C526S317100, C526S320000, C526S332000, C430S270100

Reexamination Certificate

active

06699951

ABSTRACT:

CROSS REFERENCE TO RELATED APPLICATION
This application is based on application No. 2001-17600 filed in the Korean Industrial Property Office on Apr. 3, 2001, the disclosure of which is incorporated herein by reference.
1. Field of the Invention
The present invention relates to a monomer and a polymer for a photoresist, a photoresist composition, and a phosphor layer composition for a color cathode ray tube. More particularly, the present invention relates to a photoresist composition for a color cathode ray tube which causes no environmental pollution and has good storage stability and high sensitivity.
2. Background of the Invention
As electro beams emitted from an electron gun hit phosphor on a phosphor layer, the energy of the electron beams is converted into photon energy to excite the phosphor.
The phosphor layer is generally made through the following process. An inner surface of a panel with a black matrix is coated with a phosphor slurry and dried. The coated panel is exposed to a high-pressure mercury lamp through a photo mask and developed using distilled water. Such a process is repeated three times for green, blue, and red phosphors.
The phosphor slurry includes a phosphor, a photoresist resin which is a photosensitive polymer, additives such as photo-crosslinking agents, agents for increasing adhesion, and dispersion-aids. Alternatively, an additional photoresist composition including a photoresist resin and a photo-crosslinking agent is coated before coating the slurry to improve adhesion of the phosphor.
The photoresist resin and the photo-crosslinking agent may be generally polyvinyl alcohol-sodium dichromate (PVA-SDC) or ammonium dichromate (ADC). Alternatively, they may be a modified polyvinyl alcohol or polyvinyl alcohol introduced with polyvinyl pyrrolidone (U.S. Pat. Nos. 3,558,310 and 4,556,626, and Japanese Patent Laid-open No. Hei. 5-173331). Polyvinyl alcohol-sodium dichromate (PVA-SDC) and ammonium dichromate (ADC) have excellent sensitivity, produce a phosphor pattern without residue in unexposed region. However, it is difficult to control the pattern width. Moreover, their dark erosion reaction causes storage problems, and chrome included in sodium dichromate and ammonium dichromate causes environmental pollution.
Thus, various proposals to use a water-soluble photoresist for printing without chrome in the phosphor slurry for the color cathode ray tube have been attempted. The water-soluble photoresist may be a water-soluble polymer-bisazide or a water-soluble polymer-diazo, or a polyvinyl alcohol-stillbazolium-based compound.
The water-soluble polymer-bisazide-based compound is disclosed in U.S. Pat. Nos. 3,884,703, 3,917,794, 4,086,090, 4,099,937, 4,191,571, 4,254,197, 4,332,874, 4,596,755, and 4,954,418, Japanese Patent Laid-open No. Sho. 57-182379, and Korean Patent Laid-open No. 1999-58898. The water-soluble polymer-diazo-based compound is disclosed in U.S. Pat. Nos. 3,808,004, 3,933,499, 3,965,278, 4,093,465, 4,123,276, 4,154,614, 4,172,729, 4,296,193, 4,471,043, 4,477,552, 4,511,640, 4,539,285, 4,614,701, 4,618,562, 4,645,730, 4,650,738, 4,731,316, 4,745,042, 4,902,602, 4,960,671, 5,053,310, 5,173,382, 5,260,161, 5,272,036, and 55,424,165, Japanese Patent Laid-open Nos. Sho. 50-38459, Sho. 52-3276, Sho. 60-247238, and Sho. 62-145626, and Korean Patent Laid-open Nos. 1999-12415, 1999-12416, and 1999-85157. Polyvinyl alcohol-stillbazolium-based compound is disclosed in U.S. Pat. No. 4,990,417, 5,506,089, Japanese Patent No. Sho. 55-24126, and Korean Patent Laid-open No.1999-15235.
Water-soluble polymers include polyvinyl alcohol, polyvinyl pyrrolidone, and polyacrylamide (PAD). Photo-crosslinking agents for bisazide compounds include 4,4′-diazidobenzalacetophenone-2-sulfonate, 4,4′-diazidoestillben-2,2′-disulfonate, and 4,4′-diazidostillben-&ggr;-carboxylic acid, and those for diazo compounds include salts of vinylazidobenzylideneacetophenonesulfonic acid, vinylazidobenzylideneacetophenone carboxylic acid, vinylazidocinnamylideneacetophenonesulfonic acid, and vinylazidocinnamyllideneacetophenoecarboxylic acid.
The produced phosphor prepared using the above-described photoresist slurry without chrome has good photosensitivity, good storage stability, but inferior sensitivity and poor adhesion to a panel, when compared with that using a polyvinyl alcohol-sodium dichromate slurry.
Azide polymers exhibiting improved characteristics over the water-soluble polymer-bisazide-based photoresist are disclosed in U.S. Pat. Nos. 4,241,162, 4,588,669, 5,024,920, and 5,385,804, Japanese Patent Laid-open No. Hei. 05-216219, and Korean Patent Laid-open No. 2000-37354. The azide polymer is prepared by binding an azide group into a water-soluble polymer.
The azide polymer has improved sensitivity and degrees of crosslinkage over a mixture of a polymer and an azide compound so that the azide polymer exhibits good adhesion. However, with this process, it is difficult to produce wanted products and it is difficult to introduce azide groups into the polymer at a desired ratio.
SUMMARY OF THE INVENTION
It is an object of the present invention to provide a monomer for a photoresist for a color cathode ray tube without using an environmental pollution causing material.
It is another object to provide a polymer for a photoresist for a cathode ray tube with the monomer.
It is still another object to provide a photoresist composition for a color cathode ray tube, which causes no environmental pollution, good storage stability and high photosensitivity.
It is still another object to provide a phosphor layer composition for a cathode ray tube including the polymer.
These and other objects may be achieved by a monomer for producing photoresist used in a cathode ray tube, presented by formula 2.
wherein:
R
1
is H or CH
3
,
R
2
is (R)
&agr;
(CH
2
)
&bgr;
R′ or (R)
&agr;
((CH
2
)
m
O)
&ggr;
R′, wherein R is CO, CO
2
, O, OCO or OCO
2
, R′ is O, CO
2
, or OCO
2
, &agr; is 0 or 1, &bgr; is 0 to 5, m is 1 or 2, and &ggr; is 1 to 5,
R
4
, which combines an acetal compound and a vinyl compound, is a saturated or unsaturated C
1
-C
5
alkyl, a C
1
-C
5
ether, or a C
1
-C
5
carbonyl; and
R
5
is a saturated or unsaturated C
1
-C
5
alkyl, a C
1
-C
5
ether, or a C
1
-C
5
carbonyl.
The present invention further provides a photoresist polymer for a color cathode ray tube including a monomer of formula 2. Preferred is a polymer of formula 1.
wherein,
R
1
is H or CH
3
,
R
2
is (R)
&agr;
(CH
2
)
&bgr;
R′ or (R)
&agr;
((CH
2
)
m
O)
&ggr;
R′, wherein R is CO, CO
2
, O, OCO or OCO
2
, R′ is O, CO
2
, or OCO
2
, &agr; is 0 or 1, &bgr; is 0 to 5, m is 1 or 2, and &ggr; is 1 to 5,
R
4
, which combines an acetal compound and a vinyl compound, is a saturated or unsaturated C
1
-C
5
alkyl, a C
1
-C
5
ether, or a C
1
-C
5
carbonyl;
R
5
is a saturated or unsaturated C
1
-C
5
alkyl, a C
1
-C
5
ether or a C
1
-C
5
carbonyl;
R
6
and R
8
are identical or are each independently selected from a single bond, (R)
&agr;
(CH
2
)
&bgr;
R′ and (R)
&agr;
((CH
2
)
m
O)
&ggr;
R′, wherein R is CO, CO
2
, O, OCO or OCO
2
, R′ is O, CO
2
, or OCO
2
, &agr; is 0 or 1, &bgr; is 0 to 5, m is 1 or 2, and &ggr; is 1 to 5;
R
7
is a hydroxyl group;
R
9
is a carboxyl group;
a, b, and c each represent the mole ratio of its corresponding monomer, where a and b each have a value of 0 to 0.99, and c has a value of 0.01 to 0.3; and
n represents the degree of polymerization of each polymer and has a value of at least 2.
The present invention provides a photoresist composition for a color cathode ray tube including a copolymer of formula 2 and a photo-acid generator. A mixture of a phosphor and the photoresist composition may be used a phosphor layer composition for a color cathode ray tube.
DETAILED DESCRIPTION OF THE INVENTION
The present invention relates to a novel photoresist polymer and composition for a color cathode ray tube, without using an environmental pollution causing material, good storage ability and high precision.

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