Monomer and a polymer obtained therefrom

Details Monomer and a polymer obtained therefrom Monomer and a polymer obtained therefrom

1998-11-18

2000-12-12

Pezzuto, Helen L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Polymers from only ethylenic monomers or processes of...

526282, 526284, 526285, 5263031, 526308, 526309, 526310, 526319, 526332, 5263471, C08F 1000

Patent

active

061600687

ABSTRACT:
This invention relates to a monomer shown by the general formula [1] ##STR1## (wherein X' is a cyclic hydrocarbon residue containing polymerizable double bond(s), which may have a substituent, Z is a spacer or a direct bond and R is a substituted alkyl or alkenyl group having one or two protected hydroxyl groups as substituent) and a polymer containing a segment derived from the above monomer.
The said polymer is useful for a resist composition, etc. utilized in the production of semiconductor elements, etc. and the said monomer is useful as a starting material for the polymer, and a resist composition using the said polymer can remarkably advantageously be used as a resist material for ArF excimer laser beams which has been considered to be a valuable technology for exposure belonging to the coming generation.

REFERENCES:
patent: 5059698 (1991-10-01), Schulthess et al.
patent: 5621019 (1997-04-01), Nakano

Affiliated with

Also associated with

Rating

Monomer and a polymer obtained therefrom does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Monomer and a polymer obtained therefrom, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Monomer and a polymer obtained therefrom will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-218711