Monolithic semiconductor device having a microstructure and a tr

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Responsive to non-optical – non-electrical signal

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257415, 257417, 257420, 7351421, 7351422, 7351436, H01L 2982

Patent

active

058083316

ABSTRACT:
A semiconductor device (15) having a sensor (11) and a transistor (10) formed on a monolithic semiconductor substrate (16). The sensor (11) has a source region (41), a drain region (42), and a microstructure (12) which is formed from a conductive layer (28). The microstructure (12) modulates a channel region between the source and drain regions (41,42). The transistor has a gate structure, a portion of which is formed from the same conductive layer (28) used to form the microstructure (12). Anneal steps are performed on the conductive layer (28) to remove stress prior to the formation of source and drain regions (34,36) of the transistor (10). A self-test structure (14) is formed adjacent to the microstructure (12) which is used to calibrate and verify the operation of the sensor (11).

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Nathanson et al., "The Resonant Gate Transistor," IEEE Transactions on Electron Devices, vol. ED-14, No. 3, Mar. 1967, pp. 117-133.

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