Monolithic semiconductor body with convex structure

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Field effect device in non-single crystal – or...

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257 69, 257 74, 257915, H01L 2906, H01L 29786, H01L 2711

Patent

active

055392164

ABSTRACT:
A monolithic semiconductor body (26) resides in an opening (16) formed in an insulating layer (14). The monolithic semiconductor body (26) includes an elongated region (20) filling the opening (16) in the insulating layer (14) and contacting a semiconductor region (12). The monolithic semiconductor body (26) further includes a surface region (24) overlying the elongated region (20) and a portion of the surface (22) of the insulating layer (14) adjacent to the opening (16). The monolithic semiconductor body (26) is fabricated by first depositing a layer of semiconductor material into the opening (16), then planarizing the surface of the insulating layer (14). Next, a selective deposition process is carried out to form the surface region (24) using the semiconductor material in the opening (16) as a nucleation site. The radius of curvature of the surface region (24) is determined by the amount of controlled overgrowth during the selective deposition process.

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patent: 5019879 (1991-05-01), Chiu
patent: 5021848 (1991-06-01), Chiu
patent: 5063172 (1991-11-01), Manley
patent: 5114879 (1992-05-01), Madan
patent: 5308445 (1994-05-01), Takasu
patent: 5414277 (1995-05-01), Anzai

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