Monolithic pattern-sensitive detector

Details Monolithic pattern-sensitive detector Monolithic pattern-sensitive detector

1998-06-12

2000-10-10

Hannaher, Constantine

Radiant energy

Invisible radiant energy responsive electric signalling

Ultraviolet light responsive means

250365, H01L 310328

Patent

active

06130431&

ABSTRACT:
Extreme ultraviolet light (EUV) is detected using a precisely defined reference pattern formed over a shallow junction photodiode. The reference pattern is formed in an EUV absorber preferably comprising nickel or other material having EUV- and other spectral region attenuating characteristics. An EUV-transmissive energy filter is disposed between a passivation oxide layer of the photodiode and the EUV transmissive energy filter. The device is monolithically formed to provide robustness and compactness.

REFERENCES:
patent: 5598014 (1997-01-01), Barany et al.
Ogawa et al., "Normal incidence spectrophotometer with high-density transmission grating technology and high-efficiency silicon photodiodes for absolute solar extreme-ultraviolet irradiance measurements", Optical Engineering, vol. 32, No. 12/3121-25, Dec. 1993.
Gullikson et al., "Stable silicon photodiodes for absolute intensity measurements in the VUV and soft x-ray regions", Proc. of the VUV-11 Conference.

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