Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1990-04-20
1992-11-17
Kunemund, Robert
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
505703, 505704, 437 84, 437108, 437126, 437976, 148DIG25, 148DIG72, 148DIG97, H01L 2120
Patent
active
051643596
ABSTRACT:
A semiconductor device and processing technique is provided for monolithic integration of a single crystal compound element semiconductor on a ceramic substrate. A high resistivity semi-insulating buffer layer is epitaxially grown on the ceramic substrate and has an elastically transitional lattice constant matching at its lower surface the lattice constant of the ceramic substrate, and matching at its upper surface the lattice constant of the semiconductor layer.
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Calviello Joseph A.
Hickman Grayce A.
Eaton Corporation
Kunemund Robert
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