Monolithic integrated circuit having compound semiconductor laye

Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

505703, 505704, 437 84, 437108, 437126, 437976, 148DIG25, 148DIG72, 148DIG97, H01L 2120

Patent

active

051643596

ABSTRACT:
A semiconductor device and processing technique is provided for monolithic integration of a single crystal compound element semiconductor on a ceramic substrate. A high resistivity semi-insulating buffer layer is epitaxially grown on the ceramic substrate and has an elastically transitional lattice constant matching at its lower surface the lattice constant of the ceramic substrate, and matching at its upper surface the lattice constant of the semiconductor layer.

REFERENCES:
patent: 3199003 (1965-08-01), Turner
patent: 3618203 (1971-11-01), Pryor
patent: 3721583 (1973-03-01), Blakeslee
patent: 3735211 (1973-05-01), Kopnias
patent: 3744120 (1973-07-01), Burgess et al.
patent: 3766634 (1973-10-01), Babcock et al.
patent: 3854892 (1974-12-01), Burgess et al.
patent: 3911553 (1975-10-01), Burgess et al.
patent: 3993411 (1976-11-01), Babcock et al.
patent: 3994430 (1976-11-01), Cusano et al.
patent: 4129243 (1978-12-01), Cussano et al.
patent: 4368098 (1983-01-01), Manasevit
patent: 4473938 (1984-10-01), Kobayashi et al.
patent: 4632712 (1986-12-01), Fan et al.
patent: 4833101 (1989-05-01), Fujii
patent: 4837536 (1989-06-01), Honjo
patent: 4855249 (1989-08-01), Akasaki et al.
patent: 4908074 (1990-03-01), Hosoi et al.
patent: 4927471 (1990-05-01), Okuda
patent: 4935385 (1990-06-01), Biegelsen
patent: 4948752 (1990-08-01), Geissberger et al.
patent: 4963508 (1990-10-01), Umeno et al.
"A High Performance 0.12 .mu.m T-Shape Gate Ga.sub.0.5 In.sub.0.5 As/Al.sub.0.5 In.sub.0.5 As MODFET Grown by MBE Lattices Mismatched on A GaAs Substrate", Y. K. Chen et al. IEDM 431-434 (Dec. 1986).
"0.1-.mu.m Gate Al.sub.0.5 In.sub.0.5 As/Ga.sub.0.5 In.sub.0.5 As MODFET Fabricated on GaAs Substrates", G. W. Wang et al., IEEE Trans. Electron Devices 35 (7) 818-823 (1988).
"New Ceramics Fill Performance Gaps", Ronald Pound, Electronic Packaging & Production, pp. 30-33, Sep. 1987.
"Heteroepitaxial Growth and Characterization of GaAs on Silicon-on-Sapphire and Sapphire Substrates", T. P. Humphreys et al., Appl. Phys. Lett. 54(17), Apr. 24, 1989, pp. 1687-1689.
"Epitaxial films of YBa.sub.2 Cu.sub.3).sub.7-.gamma. on NdGaO.sub.3, LaGaO.sub.3, and SrTiO.sub.3 substrates deposited by laser ablation", G. Koren et al., Appl. Phys. Lett. 54(11), Mar. 13, 1989, pp. 1054-1056.
Ishiwara et al., Japanese J. Appl. Phys. Supplements, vol. 22 (1983), pp. 201-204.
Sugimura et al., "Heteroepitaxial Growth of GaAs on Sapphire . . . ", J. Crys. Growth, vol. 77, 1986, pp. 524-529.
Ohmachi et al. "High Quality GaAs on Si . . . ", Mat. Res. Soc. Symp. Proc., vol 144, 1989, pp. 297-302.
Ishiwara et al., "Heteroepitaxy of Si, Ge, and GaAs Films on CaF.sub.2 /Si Structures" Mat. Res. Soc. Symp Proc., vol. 67, 1986, pp. 105-114.
Lee et al., "Epitaxy of GaAs on Si: MBE and OMCBD", Mat. Res. Soc. Symp. Proc., vol. 91, 1987, pp. 33-45.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Monolithic integrated circuit having compound semiconductor laye does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Monolithic integrated circuit having compound semiconductor laye, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Monolithic integrated circuit having compound semiconductor laye will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1171997

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.