Monofunctional monomer-containing photosensitive composition for

Details Monofunctional monomer-containing photosensitive composition for Monofunctional monomer-containing photosensitive composition for

1976-03-11

1978-08-22

Welsh, John D.

Gas separation: apparatus

Solid sorbent apparatus

With programmed, cyclic, or time responsive control means

96115R, 96 351, 96 86P, 20415922, 560 90, 560120, 560127, 560199, G03C 168

Patent

active

041086660

ABSTRACT:
A photosensitive composition for a photoresist, which comprises (A) a compound having the following general formula: ##STR1## wherein Z is a cyclic dibasic acid anhydride moiety, R.sup.1 is an alkylene group having 1 to 3 carbon atoms, R.sup.2 is hydrogen or methyl, and R.sup.3 is hydrogen, methyl, ethyl or -CH.sub.2 X in which X is chlorine or bromine, (B) a photopolymerization sensitizer, (C) a polymer being capable of giving a film-forming property, (D) a chain transfer agent and (E) a thermal polymerization inhibitor; and a laminated photosensitive element which has a substantially dry photosensitive layer of the photosensitive composition. The composition and element are capable of giving a minute resist pattern which is excellent as an etching resist or metal plating resist and can be readily removed after etching or metal plating.

REFERENCES:
patent: 2760863 (1956-08-01), Plambeck, Jr.
patent: 3367992 (1968-02-01), Bearden
patent: 3663599 (1972-05-01), Koshimura et al.
Encyclopedia of Polymer Science & Tech. Interscience (1972), pp. 575-576, 588, 595, 604, 607-608.
Chemical Abstracts, pp. 6988, 6989, 8th Coll. Ed.

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