Specialized metallurgical processes – compositions for use therei – Compositions – Loose particulate mixture containing metal particles
Reexamination Certificate
2005-04-26
2005-04-26
Mai, Ngoclan T. (Department: 1742)
Specialized metallurgical processes, compositions for use therei
Compositions
Loose particulate mixture containing metal particles
Reexamination Certificate
active
06884278
ABSTRACT:
It is an object of the present invention to provide spherical metal particles having excellent monodispersity. The present invention relates to a method of manufacturing monodisperse spherical metal particles characterized by passing liquid metal through a porous membrane so as to disperse the resulting liquid metal particles in a continuous liquid phase.
REFERENCES:
patent: 4657875 (1987-04-01), Nakashima et al.
patent: 4863510 (1989-09-01), Tamemasa et al.
patent: 5278106 (1994-01-01), Nakashima et al.
patent: 5588983 (1996-12-01), Tani et al.
patent: 5609919 (1997-03-01), Yuan et al.
patent: 6494931 (2002-12-01), Mukuno et al.
patent: 66-66777 (1986-02-01), None
patent: 61-279603 (1986-12-01), None
patent: 8-2416 (1990-04-01), None
patent: 07-011308 (1995-01-01), None
patent: 11-264004 (1999-09-01), None
patent: 2000-144215 (2000-05-01), None
patent: 2000-192112 (2000-07-01), None
patent: 2000-328112 (2000-11-01), None
R. R. Getty et al., High Performance Thick Film Gold Conductors, Solid State Technology, vol. 26, No. 10, Oct. 1983, pp. 163-168.
Akazaki Izumi
Nakashima Tadao
Shimizu Masataka
Torigoe Kiyoshi
Mai Ngoclan T.
Miyazaka Prefecture
Webb Ziesenheim & Logsdon Orkin & Hanson, P.C.
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