Monocrystalline diamond layer and method for the production...

Single-crystal – oriented-crystal – and epitaxy growth processes; – Processes of growth from liquid or supercritical state – Having growth from a solution comprising a solvent which is...

Reexamination Certificate

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C117S075000

Reexamination Certificate

active

07396408

ABSTRACT:
This invention relates to a method for the production of diamond films with low misorientation through the deposition of diamond on a film system, whereby the film system exhibits a substrate film made of monocrystalline silicon or silicon carbide, at least one buffer film arranged on that, and at least one metal film made of a refractory metal arranged on that, whereby the diamond is deposited on the at least one metal film.

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PCT International Search Report for PCT/EP2004/004678 completed by the EP Searching Authority on Jul. 29, 2004.

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