Chemistry of inorganic compounds – Oxygen or compound thereof – Metal containing
Patent
1992-02-27
1994-06-07
Brunsman, David
Chemistry of inorganic compounds
Oxygen or compound thereof
Metal containing
501 95, 501103, 106450, C01G 2502, C04B 3548
Patent
active
053187652
ABSTRACT:
A monoclinic zirconium dioxide with an SiO.sub.2 content below 1.0% by weight is provided which is characterized by dendrite-shaped particles with an average grain size (d.sub.50 value) in a range of 0.5 .mu.m to 3.0 .mu.m and a specific surface (BET) in a range of 3 to 15 m.sup.2 /g. This zirconium dioxide is produced by thermally splitting zirconium silicate in a high-frequency- or medium-frequency induction melting furnace with sintering crust crucible, quenching the melt by blowing on a stream of melt with air and/or spraying it with water and leaching out the thermally split zirconium silicate with concentrated alkali lye at 100.degree. 200.degree. C. The zirconium dioxide of the invention provides a material with improved suitability for the production of zirconium silicate pigments of the host lattice type and inclusion type so as to provide for more color-intensive pigments.
REFERENCES:
patent: 3811907 (1974-05-01), Scammon, Jr. et al.
patent: 4279655 (1981-07-01), Garvie et al.
patent: 4829028 (1989-05-01), Seki et al.
patent: 5011673 (1991-04-01), Kriechbaum
patent: 5169809 (1992-12-01), Brenna et al.
"Zirconia Production Stepped Up," Ceramics, Feb. 1974, p. 30.
W. C. Butterman et al., Amer. Mineralogist 52 (1967) p. 884.
Binder Dieter
Hoffmeister Hans
Kleinschmit Peter
Reuter Roland
Brunsman David
Degussa - Aktiengesellschaft
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