Monitoring structure

Details Monitoring structure Monitoring structure

2011-01-11

2011-01-11

Noland, Thomas P (Department: 2856)

Measuring and testing

Sampler, sample handling, etc.

Capture device

C134S034000, C134S104200, C134S113000, C134S118000

Reexamination Certificate

active

07866224

ABSTRACT:
Apparatus is provided for determining presence of contamination on a lithography mask, including: a fluid trap having a base and at least one wall member extending substantially perpendicularly to the base for trapping fluid on a portion of the base when fluid introduced during a cleaning process of the mask is removed.

REFERENCES:
patent: 3401668 (1968-09-01), Welsh et al.
patent: 5454519 (1995-10-01), Luck
patent: 6172409 (2001-01-01), Zhou
patent: 6922265 (2005-07-01), Ozawa et al.
patent: 2003/0221620 (2003-12-01), Yamazaki
patent: 2004/0031442 (2004-02-01), Yamazaki et al.
patent: 2004/0035360 (2004-02-01), Yamazaki et al.
patent: 2005/0233225 (2005-10-01), Ibaragi
patent: 2007/0002516 (2007-01-01), Matsumoto

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