Monitoring method, process and system for photoresist...

Details Monitoring method, process and system for photoresist... Monitoring method, process and system for photoresist...

2006-05-30

2006-05-30

Ashton, Rosemary (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Regenerating image processing composition

C210S634000, C210S641000

Reexamination Certificate

active

07052826

ABSTRACT:
A monitoring method for photoresist regeneration, a process and a system for the same are provided. In the photoresist regeneration process of the invention, the solid content and viscosity of photoresist are adjusted by condensation under reduced pressure or dilution with photoresist thinner until the final solid content and viscosity reach the predetermined values thereof obtained through the quantification equation of the invention and then the waste photoresist is caused to pass through filters for removing pollution particles contained therein, such that the regenerated photoresist is acquired.

REFERENCES:
patent: 11-133619 (1999-05-01), None
English translation of JP 11-133619, May 1999.

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