Monitoring method, exposure method, a manufacturing method...

Details Monitoring method, exposure method, a manufacturing method... Monitoring method, exposure method, a manufacturing method...

2005-03-15

2005-03-15

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S022000, C430S313000, C355S027000, C355S055000, C355S067000, C356S399000

Reexamination Certificate

active

06866976

ABSTRACT:
A monitoring method, includes: delineating a monitor resist pattern on an underlying film, the monitor resist pattern having a tilted sidewall slanted to a surface of the underlying film at least at one edge of the monitor resist pattern; measuring a width of the monitor resist pattern in an orthogonal direction to a cross line of the tilted sidewall intersecting with the underlying film; delineating a monitor underlying film pattern by selectively etching the underlying film using the monitor resist pattern as a mask; measuring a width of the monitor underlying film pattern in the orthogonal direction; and obtaining a shift width in the monitor underlying film pattern from a difference between the width of the monitor resist pattern and the width of the monitor underlying film pattern.

REFERENCES:
patent: 6376139 (2002-04-01), Fujisawa et al.
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patent: 3052064 (2000-04-01), None
patent: 2000-310850 (2000-11-01), None
patent: 2003-173948 (2003-06-01), None
Masafumi Asano et al., “CD Control with Effective Exposure Dose Monitor Techinque in Photolithography”, Proc. SPIE vol. 4691, pp. 280-287, Mar. 5-8, 2002.
Starikov, “Exposure Monitor Structure,” SPIE (1990), 1261:315-324.

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