Monitoring film parameters using polarimetry of optical radiatio

Details Monitoring film parameters using polarimetry of optical radiatio Monitoring film parameters using polarimetry of optical radiatio

1975-10-30

1977-03-29

Borchelt, Archie R.

Radiant energy

Invisible radiant energy responsive electric signalling

Infrared responsive

250339, 250349, 356118, G01J 404

Patent

active

040151271

ABSTRACT:
A method and apparatus are disclosed for monitoring parameters of a film or coating by directing a beam of optical radiation at a film supported on a metal substrate at an angle to the film so as to plane polarize any radiation transmitted through the film, reflecting a portion of the radiation from the interface between the film and substrate, transmitting the radiation through a polarizing medium before and/or after it has been transmitted through the film to block any component of radiation other than that which is or will be transmitted through the film, and transducing the radiation reflected from the interface to provide an output signal which is a function of a parameter of the film.

REFERENCES:
patent: 3017512 (1962-01-01), Wolbert
patent: 3355980 (1967-12-01), Mathais
patent: 3426201 (1969-02-01), Hilton et al.
patent: 3623818 (1971-11-01), Gardner et al.
patent: 3734619 (1973-05-01), Newburgh
patent: 3802778 (1974-04-01), Newburgh
patent: 3824017 (1974-07-01), Gaylon
Fundamentals of Optics, by Jenkins and White, Chap. 24, (3rd edition, 1957).
Simple Technique for Very Thin SiO.sub.2 Film Thickness Measurements, by Pliskin and Esch, 11 Applied Physics Letters, No. 8 (Oct. 15, 1967).

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