Monitoring chemical flow rate in a water treatment system

Measuring and testing – Volume or rate of flow – Combined

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Details

137893, 137 475, G01F 1509

Patent

active

058279598

ABSTRACT:
A pressurized chemical tank is connected to a water line through a restriction (e.g., a gas flow control valve). A vacuum-regulating check valve is for maintaining the vacuum pressure of the gas flowing between the tank and the restriction. A gas flow rate sensor is between the restriction and the water line. The sensor is constructed to be responsive to pressure in the gas line, and can be connected to a remote display and/or storage device. The sensor can also provide a feedback signal to a control system for controlling the flow rate.

REFERENCES:
patent: 3029949 (1962-04-01), Whitlock
patent: 3194254 (1965-07-01), Zmek
patent: 3756220 (1973-09-01), Tehrani et al.
patent: 4722360 (1988-02-01), Odajima et al.
patent: 4883086 (1989-11-01), Lejnar
patent: 5050438 (1991-09-01), Ezell, Jr.
patent: 5230368 (1993-07-01), Berfield
patent: 5237865 (1993-08-01), Wada
patent: 5257538 (1993-11-01), Spendell
patent: 5509434 (1996-04-01), Boyd et al.

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