Monitoring apparatus and method particularly useful in photolith

Details Monitoring apparatus and method particularly useful in photolith Monitoring apparatus and method particularly useful in photolith

1998-11-02

2000-12-26

Mathews, Alan A.

Photocopying

Projection printing and copying cameras

With developing

356400, 382145, 396611, 414935, G03B 2732, H01L 2166, G01B 902

Patent

active

06166801&

ABSTRACT:
Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

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C.P. Ausschnitt, M.E., Lagus, "Seeing the Forest for the Trees: a New Approach for CD Control", SPIE, vol. 3332, 212-220), (1998).

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