Monitoring apparatus and method particularly useful in...

Details Monitoring apparatus and method particularly useful in... Monitoring apparatus and method particularly useful in...

2009-04-23

2010-10-26

Mathews, Alan A (Department: 2882)

Photocopying

Projection printing and copying cameras

With developing

C396S611000, C356S237500, C356S400000

Reexamination Certificate

active

07821614

ABSTRACT:
Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

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