Monitoring apparatus and method particularly useful in...

Details Monitoring apparatus and method particularly useful in... Monitoring apparatus and method particularly useful in...

2005-01-11

2005-01-11

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With developing

C396S578000, C396S611000, C356S237400, C356S237500, C356S400000

Reexamination Certificate

active

06842220

ABSTRACT:
A method for in process monitoring of the parameters of a substrate undergoing a processing within a photolithography tools arrangement which includes substrate loading and unloading stations, and substrate coating, exposure and developing stations. The method includes the step of supplying the substrate after being developed to a monitoring station and analyzing the monitoring data to estimate the photolithography process to be used for controlling thereof.

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