Monitoring and control system for selective regeneration of alka

Chemical apparatus and process disinfecting – deodorizing – preser – Analyzer – structured indicator – or manipulative laboratory... – Automatic analytical monitor and control of industrial process

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204422, 210670, 210679, G01N 2710

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active

053688180

ABSTRACT:
A cation exchange resin is regenerated to remove alkanolamine and alkali metal cations from the resin by eluting the resin with alkali metal hydroxide to selectively displace alkanolamine from the resin, followed by elution of the resin with a mineral acid to displace alkali metal cations and any remaining alkanolamine from the resin. During this process, the resin is monitored by measuring and recording the conductance of the effluent from the resin and such recorded conductance is used to control the regenerant streams to provide more efficient regeneration of the resin.

REFERENCES:
patent: 2628191 (1948-02-01), Sard
patent: 3246759 (1966-04-01), Matalon
patent: 3531252 (1970-09-01), Rivers
patent: 4076618 (1978-02-01), Zeibilsky
patent: 4199323 (1980-04-01), Miller et al.
patent: 4242097 (1980-12-01), Rich, Jr. et al.
patent: 4263145 (1981-04-01), Wirth, Jr.
patent: 4814281 (1989-03-01), Byers
patent: 4880513 (1989-11-01), Davis et al.
patent: 4970344 (1990-11-01), Keller
patent: 5006258 (1991-04-01), Veatch et al.
patent: 5045291 (1991-09-01), Keller

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