Monitoring and control of a fabrication process

Details Monitoring and control of a fabrication process Monitoring and control of a fabrication process

2011-07-05

2011-07-05

Kunemund, Robert M (Department: 1714)

Single-crystal, oriented-crystal, and epitaxy growth processes;

Apparatus

With means for measuring, testing, or sensing

C117S202000, C117S087000, C117S088000, C117S094000, C117S095000

Reexamination Certificate

active

07972440

ABSTRACT:
A system (10) for monitoring and controlling a fabrication process includes at least a first subsystem (12), a crystallographic analysis subsystem (14), and a second subsystem (16), wherein the first subsystem and second subsystem perform respective fabrication steps on a workpiece. The crystallographic analysis subsystem may be coupled to both the first subsystem and second subsystem. The analysis subsystem acquires crystallographic information from the workpiece after the workpiece undergoes a fabrication step by the first subsystem and then provides information, based on the crystallographic information acquired, for modifying parameters associated with the respective fabrication steps. The system may also include neural networks (24, 28) to adaptively modify, based on historical process data (32), parameters provided to the respective fabrication steps. The analysis subsystem may include a electromagnetic source (61), a detector (66), a processor (67), a controller (68) and a scanning actuator (65).

REFERENCES:
patent: 4649556 (1987-03-01), Rinik et al.
patent: 5463977 (1995-11-01), Manada et al.
patent: 5466934 (1995-11-01), Adams et al.
patent: 2003/0234359 (2003-12-01), Drown et al.

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