Monitoring a system during low-pressure processes

Details Monitoring a system during low-pressure processes Monitoring a system during low-pressure processes

2007-11-27

2007-11-27

Barlow, John (Department: 2863)

Data processing: measuring, calibrating, or testing

Measurement system

Performance or efficiency evaluation

Reexamination Certificate

active

11278379

ABSTRACT:
A method of monitoring a processing system in real-time using low-pressure based modeling techniques that include processing one or more of wafers in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.

REFERENCES:
patent: 6195621 (2001-02-01), Bottomfield
patent: 6351723 (2002-02-01), Maekawa
patent: 6803548 (2004-10-01), Wang et al.
patent: 2005/0252884 (2005-11-01), Lam et al.

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