Monitoring a single-wafer processing system

Data processing: measuring – calibrating – or testing – Measurement system – Performance or efficiency evaluation

Reexamination Certificate

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Reexamination Certificate

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07340377

ABSTRACT:
A method of monitoring a single-wafer processing system in real-time using low-pressure based modeling techniques that include processing a wafer in a processing chamber; determining a measured dynamic process response for a rate of change for a process parameter; executing a real-time dynamic model to generate a predicted dynamic process response; determining a dynamic estimation error using a difference between the predicted dynamic process response and the expected process response; and comparing the dynamic estimation error to operational limits.

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European Patent Office, International Search Report and Written Opinion received in corresponding PCT Application No. PCT/US2007/065473, dated Aug. 17, 2007, 14 pgs.

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